Nonlinear and Ultrafast Optical Studies of Interfacial Processes in Photovoltaic Nanomaterials

Text Registration

Nonlinear and Ultrafast Optical Studies of Interfacial Processes in Photovoltaic Nanomaterials

Status

Published

on 14 Sept 2020

Year of Creation

2020

Hui Fang

Registration Number

TX0008917278

on 14 Sept 2020

The U.S. Copyright record (Registration Number: TX0008917278) dated 14 Sept 2020, pertains to an electronic file (eService) titled "Nonlinear and Ultrafast Optical Studies of Interfacial Processes in Photovoltaic Nanomaterials" created in 2020. The copyright holder is Hui Fang, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Hui Fang.

Hui Fang

Application Details

Registration Number

TX0008917278

Registration Date

9/14/2020

Year of Creation

2020

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Electronic file (eService)

First Publication Nation

United States

Personal Authors

Hui Fang

Notes

Rights Note: Mark Dill, ProQuest, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Nonlinear and Ultrafast Optical Studies of Interfacial Processes in Photovoltaic Nanomaterials

Author Statement: Hui Fang Citizenship: not known Authorship: text

Notes

Rights Note: Mark Dill, ProQuest, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Nonlinear and Ultrafast Optical Studies of Interfacial Processes in Photovoltaic Nanomaterials

Author Statement: Hui Fang Citizenship: not known Authorship: text

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