Proceedings of SPIE- Extreme Ultraviolet (EUV) Lithography XII [Published: 2021-04-19. Issue: vol. 11609, 22-26 February 2021]

Serial Registration

Proceedings of SPIE- Extreme Ultraviolet (EUV) Lithography XII [Published: 2021-04-19. Issue: vol. 11609, 22-26 February 2021]

Status

Published

on 20 May 2021

Year of Creation

2021

SPIE

Registration Number

TX0008979113

on 20 May 2021

The U.S. Copyright record (Registration Number: TX0008979113) dated 20 May 2021, pertains to an electronic file (eService) titled "Proceedings of SPIE- Extreme Ultraviolet (EUV) Lithography XII [Published: 2021-04-19. Issue: vol. 11609, 22-26 February 2021]" created in 2021. The copyright holder is SPIE, known for their creative contributions in serial registration. For any inquiries concerning this copyrighted material, kindly reach out to SPIE.

SPIE

Application Details

Registration Number

TX0008979113

Registration Date

5/20/2021

Year of Creation

2021

Agency Marc Code

DLC-CO

Record Status

New

Corporate Author

SPIE

Physical Description

Electronic file (eService)

First Publication Nation

United States

ISSN

0277-786X

Corporate Authors

SPIE

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States

Copyright Local Holdings: vol. 11609, 22-26 February 2021 (C.O. correspondence) Created 2021 Pub. 2021-04-19 Reg. 2021-06-30 TX0008979113 ADIC

Local Copyright Note: C.O. correspondence

Statements

Application Title Statement: Proceedings of SPIE- Extreme Ultraviolet (EUV) Lithography XII

Author Statement: SPIE employer for hire Domicile: United States Citizenship: United States Authorship: Collective Work Authorship and Component Work(s) authored or fully owned by the Collective Work Author

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States

Copyright Local Holdings: vol. 11609, 22-26 February 2021 (C.O. correspondence) Created 2021 Pub. 2021-04-19 Reg. 2021-06-30 TX0008979113 ADIC

Local Copyright Note: C.O. correspondence

Statements

Application Title Statement: Proceedings of SPIE- Extreme Ultraviolet (EUV) Lithography XII

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