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Visit USCOStudy of silicon/silicon dioxide interface passivation and silicon dioxide reliability on deuterium implanted silicon
Text Registration
Copyright Title
Study of silicon/silicon dioxide interface passivation and silicon dioxide reliability on deuterium implanted silicon
Status
Published
on 12 Mar 2009
Year of Creation
2005
Copyright Claimant
Tias Kundu
Registration Number
TX0006652950
on 12 Mar 2009Copyright Summary
The U.S. Copyright record (Registration Number: TX0006652950) dated 12 Mar 2009, pertains to an electronic file (eService) titled "Study of silicon/silicon dioxide interface passivation and silicon dioxide reliability on deuterium implanted silicon" created in 2005. The copyright holder is Tias Kundu, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Tias Kundu.
Application Details
Registration Number
TX0006652950
Registration Date
3/12/2009
Year of Creation
2005
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Computer text data
Notes
Rights Note: Rights and permissions info. on CORDS appl. in CO
Local Copyright Note: Electronic registration
Statements
Author Statement: entire text: Tias Kundu
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