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Visit USCOStudy of silicon/silicon, silicon/silicon dioxide, and metal-oxide-semiconductor (MOS) using positrons
Text Registration
Copyright Title
Study of silicon/silicon, silicon/silicon dioxide, and metal-oxide-semiconductor (MOS) using positrons
Status
Published
on 14 Jun 2007
Year of Creation
1991
Copyright Claimant
To Chi Leung, 1961
Registration Number
TX0003371682
on 14 Jun 2007Copyright Summary
The U.S. Copyright record (Registration Number: TX0003371682) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Study of silicon/silicon, silicon/silicon dioxide, and metal-oxide-semiconductor (MOS) using positrons" created in 1991. The copyright holder is To Chi Leung, 1961, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to To Chi Leung, 1961.
Application Details
Registration Number
TX0003371682
Registration Date
6/14/2007
Year of Creation
1991
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Microfiche
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