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Visit USCOAtomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) of Thin Films: Synthesis and Characterization of a New Class of Ald Precursors, Ald of PrAlO3 Thin Films, and Thermal Ale of Cobalt Metal Films
Text Registration
Copyright Title
Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) of Thin Films: Synthesis and Characterization of a New Class of Ald Precursors, Ald of PrAlO3 Thin Films, and Thermal Ale of Cobalt Metal Films
Status
Published
on 2 Jul 2019
Year of Creation
2019
Copyright Claimant
Wathsala Lakmali Iwadunna Waduge
Registration Number
TX0008769724
on 2 Jul 2019Copyright Summary
The U.S. Copyright record (Registration Number: TX0008769724) dated 2 Jul 2019, pertains to an electronic file (eService) titled "Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) of Thin Films: Synthesis and Characterization of a New Class of Ald Precursors, Ald of PrAlO3 Thin Films, and Thermal Ale of Cobalt Metal Films" created in 2019. The copyright holder is Wathsala Lakmali Iwadunna Waduge, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Wathsala Lakmali Iwadunna Waduge.
Application Details
Registration Number
TX0008769724
Registration Date
7/2/2019
Year of Creation
2019
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Electronic file (eService)
First Publication Nation
United States
Notes
Rights Note: Mark Dill, ProQuest-CSA, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com
Statements
Application Title Statement: Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) of Thin Films: Synthesis and Characterization of a New Class of Ald Precursors, Ald of PrAlO3 Thin Films, and Thermal Ale of Cobalt Metal Films
Author Statement: Wathsala Lakmali Iwadunna Waduge Citizenship: not known Authorship: text
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