Theoretical Modeling of Ultrafast Optical-Field Induced Photoelectron Emission from Biased Metal Surfaces

Text Registration

Theoretical Modeling of Ultrafast Optical-Field Induced Photoelectron Emission from Biased Metal Surfaces

Status

Published

on 5 Aug 2021

Year of Creation

2021

Yi Luo

Registration Number

TX0009009009

on 5 Aug 2021

The U.S. Copyright record (Registration Number: TX0009009009) dated 5 Aug 2021, pertains to an electronic file (eService) titled "Theoretical Modeling of Ultrafast Optical-Field Induced Photoelectron Emission from Biased Metal Surfaces" created in 2021. The copyright holder is Yi Luo, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Yi Luo.

Yi Luo

Application Details

Registration Number

TX0009009009

Registration Date

8/5/2021

Year of Creation

2021

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Electronic file (eService)

First Publication Nation

United States

Personal Authors

Yi Luo

Notes

Rights Note: Mark Dill, ProQuest, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Theoretical Modeling of Ultrafast Optical-Field Induced Photoelectron Emission from Biased Metal Surfaces

Author Statement: Yi Luo Citizenship: not known Authorship: text

Notes

Rights Note: Mark Dill, ProQuest, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Theoretical Modeling of Ultrafast Optical-Field Induced Photoelectron Emission from Biased Metal Surfaces

Author Statement: Yi Luo Citizenship: not known Authorship: text

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